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Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE)

Overview

photo of PT-DSE in SNF Cleanroom

PT-DSE is an ICP (Inductively Coupled Plasma) etch system configured for Deep Si etches using alternate gas technique similar to Bosch process.

Cleanliness: 
Flexible

Processing Technique(s)

Capabilities and Specifications

Maximum Load: 
1
Notes: 

Single wafer; Bosch process for Si etching; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; need a support wafer for through wafer etching, can be used for Isotropic Si Etching

Lab Organization, Location, and NEMO Information

Lab Organization: 
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location: 
SNF Cleanroom Paul G Allen L107
NEMO Area: 
SNF: Dry Etching
NEMO ID: 
PT-DSE

Training and Maintenance

Lab Facility: 
SNF Cleanroom
Training Charges: 
1.50 hours
Primary Trainer: 
Lavendra Mandyam
Backup Trainer(s): 
Cliff Knollenberg
Primary Maintenance: 
Elmer Enriquez
Backup Maintenance: 
Mike Dickey

Steps to become a tool user

  1. Become a member of SNF.
  1. Study the relevant operating procedures:
  2. Online training and completing the quiz is required. See Online Course for general information about the online training. Go to Online Nano Course Login to log in directly to the course.Go to "nano@stanford" and then to the "PlasmaTherm Etchers Guide" section for watching the video and taking the quiz. For optional overview of plasma etching and how to choose an etcher, go to the "Dry Etching" Section for the three videos on plasma etching principles and "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment.
  3. Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
  4. Contact the primary trainer: Lavendra Mandyam