Tystar Bank 3 Tube 10 Nitride (B3T10 Clean Nitride)
Overview
Tystar 4600 Mini Bank 1Tube 4 Poly is a Low pressure Chemical vapor Deposition (LPCVD) Tube and offer processes such as:
- Silicon Nitride
- Stoichiometric silicon nitride
- low-stress silicon nitride
- Silicon Oxy Nitride
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Cleaning Required:
Pre-Diffusion Clean
Lab Supplied Materials
Material Thickness Range: 25.0 Å - 2.0 μm
Process Temperature Range:
420 °C - 800 °C
Gases
Substrate Type
Substrate Sizes
Maximum Load:
50
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Chemical Vapor Deposition
NEMO ID:
B3T10 Clean Nitride
Training and Maintenance
Lab Facility:
Training Charges:
2.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Contact the primary trainer: Neel Mehta
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Neel Mehta
