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Aluminum Gallium Arsenide
Chemical Formula:
AlGaAs
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Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
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Material Thickness Range
Approved Materials supplied by Lab
Aixtron MOCVD - III-V system
aix200
Flexible
SNF MOCVD Paul G Allen 213XA
0.00
-
5.00 μm
AlAs
AlGaAs
GaAs
GaP
GaPN
III-V materials
InAs
InGaAs
InGaAsN
