Chemical Formula:
GaP
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Aixtron MOCVD - III-V system aix200 |
SNF MOCVD Paul G Allen 213XA |
0.00 -
5.00 μm
|
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched |
|---|---|---|---|---|
|
MRC Reactive Ion Etcher mrc |
SNF Paul G Allen L107 Cleanroom |
|