Skip to content
Skip to navigation
Stanford Nanofabrication Facility
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Guide Home
Guide Home Overview
Lab Spaces
Techniques
Overview
Processing Techniques
Projects
Fab Project Courses: E241 & EE412
Community Service Projects
nano@stanford Fellowship Projects
Nano Nuggets
Processes
Runsheets
Safety & Policies
Overview
SNF Lab Manual
Safety Training
SDS
Gowning lab specific
Garment checkout for Cleanroom L107
Gowning Procedure for Cleanroom L107
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
Training
Overview/Equipment List
Training Course Online
Upcoming Training, link to NEMO
Training Shadowing Form
Training Videos
All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
"All" List of Tools
"Clean" List of Tools
"Clean-Ge" List of Tools
"Clean (MOCVD)" List of Tools
"Semiclean" List of Tools
"Flexible" List of Tools
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
Acids
Bases
Developers
Metal Etchants
Other Chemicals
Primer
Resists
Solvents
Substrate Types and Sizes
Substrate Sizes
Materials List
Gases List
Useful Links
Run NEMO (login required)
NEMO User Guide
External Links
Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
Tool Monitoring
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
Materials
Overview
Chemicals & Materials
Cleanliness Groups
"All" List of Tools
"Clean" List of Tools
"Clean-Ge" List of Tools
"Clean (MOCVD)" List of Tools
"Semiclean" List of Tools
"Flexible" List of Tools
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
Acids
Bases
Developers
Metal Etchants
Other Chemicals
Primer
Resists
Solvents
Substrate Types and Sizes
Substrate Sizes
Materials List
Gases List
Aluminum Oxide
Preferred Short Name:
Alumina
Chemical Formula:
Al
2
O
3
Al
2
O
3
is commonly used as an electrical insulator.
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Fiji 1 ALD
fiji1
Semiclean
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Metal oxides
Al
2
O
3
HfN
HfO
2
Pt
Ru
SiO
2
Ta
2
O
5
TaN
TiN
TiO
2
Various Dielectrics
ZrO
2
Fiji 2 ALD
fiji2
Flexible
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Metal oxides
Al
2
O
3
Ga
2
O
3
HfN
HfO
2
In
2
O
3
In
x
Sn
y
O
z
MoO
3
Ni
x
O
y
Pt
Ru
Si3N4
SiO
2
SnO
2
SrO
Ta
2
O
5
TiN
TiO
2
Various Dielectrics
ZrO
2
Fiji 3 ALD
fiji3
Flexible
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Al
2
O
3
HfO
2
SiO
2
TiO
2
Various Dielectrics
Lesker Sputter
lesker-sputter
Flexible
SNF Exfab Paul G Allen 155A Venice
Ag
Al
Al
2
O
3
AlSi
Au
Co
Cr
Cu
Fe
In
x
Sn
y
O
z
Nb
Ni
Pd
Si
SiO
2
Ta
Ti
TiN
W
Lesker2 Sputter
lesker2-sputter
Semiclean
SNF Paul G Allen L107 Cleanroom
1.00 μm
Ag
Al
Al
2
O
3
AlSi
Cr
Ge
In
x
Sn
y
O
z
Mo
Pd
Ru
Sc
Si
SiO
2
Sn
Ta
Ti
TiN
W
MVD
mvd
Flexible
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Al
2
O
3
C
21
H
46
O
3
Si
C
9
H
23
NO
3
Si
HfO
2
HN(CH
2
CH
2
NH
2
)
2
Various
Various Dielectrics
Savannah ALD
savannah
Flexible
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Metal oxides
Al
2
O
3
Al
x
Zn
y
O
x
Ga
2
O
3
HfO
2
SnO
2
TiO
2
Various Dielectrics
ZnO
3
ZrO
2
Etching Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
MRC Reactive Ion Etcher
mrc
Flexible
SNF Paul G Allen L107 Cleanroom
Metal oxides
Metals
Metals or metal compounds with volatile byproducts
Metals or metal compounds without volatile byproducts
Au
Ni
poly(p-xylylene)
Pt
Si
Si3N4
SiO
2
Ti
Various 2D Materials
Various Dielectrics
Various polymers
PI
Resist
Al
AlAs
AlGaAs
AlGaN
AlInP
AlN
AlSi
BiFeO
3
C
C
C
Co
CoFeB
Cr
Cu
Er
Fe
Ga
2
O
3
GaAs
GaN
GaP
GaPN
Ge
Hf
HfN
III-N materials
III-V materials
In
In
2
O
3
InAlN
InAs
InGaAlN
InGaAs
InGaAsN
InGaN
InGaP
InN
InP
InPN
InSb
Ir
LaB
6
LiNb
Nb
Ni
x
O
y
NiSi
Pd
Ru
Sc
SiC
SiGe
SiO
SiON
Sn
SnO
2
SrO
SrRuO
Ta
Ta
2
O
5
TaN
TiN
V
Various C-based
Various polymers
W
WO
3
WSi
2
Y
ZnO
3
Zr
ZrY
Alumina
AZO
Hafnia
ITO
LLZO
Moly
Moly Oxide
Poly Silicon
Ti Tungsten
Titania
YSZ
Zirconia
Projects
SOP for Thin, low temperature ALD of Al2O3 and HfO2 with seed layer
-- (Nano Nugget)
ALD Dielectric Electrical Characterization- Final Report
-- (Report)
High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report
-- (Report)
MOSCAP Characterization of SNF ALD- Final Presentation
-- (Presentation)
ALD Process for Top-Gating 2D Materials
Low temperature ALD-Grown Superconducting Tunnel Contacts