High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report PDF File: High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report This should be displaying <a href="https://snfguide.stanford.edu/files/sections/diplayfiles/interface_states_in_ald_films_report.pdf">High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report</a> inline. If it's not, look to see if your browser is set to automatically download pdf files. Materials Aluminum Oxide Hafnium Dioxide
