MVD (mvd)
Overview
MVD is a molecular vapor deposition (MVD) system. It is a self assembling monolayers (SAMs)-based configuration of a Savannah S200 from Cambridge Nanotech with 1 SAMs delivery port and 4 standard atomic layer deposition (ALD) lines. It is used to deposit organic SAMS layers and metal oxides on 2-D materials. The system can accommodate pieces up to an 8" wafer. Many thanks to Xiaoxing Xu, Ateeq Suria, Alex Piggott, and Felix Alfonso for their contributions to this page.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lab Supplied Materials
Material Thickness Range: 1.0 Å - 50.0 nm
Process Temperature Range:
24 °C - 150 °C
Gases
Substrate Sizes
Notes:
Reactor located inside glovebox
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Chemical Vapor Deposition
NEMO ID:
mvd
Training and Maintenance
Lab Facility:
Training Charges:
3.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadow labmembers who are using the MVD. Make sure to ask lots of questions until you feel familiar that you could run it yourself.
- Contact the primary trainer to set up an appointment for the written quiz.
- After successfully passing the written quiz, you will set up a time for the final practical in-lab session.
