Thermal ALD

Our thermal ALD systems primarily use DI water as a co-reactant with the metal-organic precursor to deposit films. In practice, these chambers are often used for low temperature depositions since the cooling time is much shorter than the PE-ALD tools.

A couple of useful links that help navigate ALD research in general (not specific to the SNF) are:

www.plasma-ald.com: a website created by Dr. Mark Sowa that has a survey of plasma ALD literature
www.atomiclimits.com: a website created by Professor Erwin Kessels, Eindhoven University, that provides a dynamic discussion of the ALD landscape.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Thermal ALD	MVD mvd	MVD is a molecular vapor deposition (MVD) system. It is a self assembling monolayers (SAMs)-based configuration of a Savannah S200 from Cambridge Nanotech with 1 SAMs delivery port and 4 standard atomic layer deposition (ALD) lines. The system can accommodate pieces up to an 8" wafer.	Flexible	SNF Cleanroom Paul G Allen L107
Thermal ALD	Savannah ALD savannah		Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Materials Lab Supplied	Material Thickness Range	Substrate Size	Process Temperature Range	Gases	Notes
Thermal ALD	MVD mvd	Flexible	C₉H₂₃NO₃Si Various Dielectrics Alumina DETA Hafnia ODS SAMS	1.00 Å - 50.00 nm	Pieces 2" 3" 4" 6" 8"	24 °C - 150 °C	Ar	Reactor located inside glovebox
Thermal ALD	Savannah ALD savannah	Flexible	Metal oxides Ga₂O₃ SnO₂ Various Dielectrics ZnO₃ Alumina AZO Hafnia Titania Zirconia	1.00 Å - 50.00 nm	Pieces 2" 3" 4" 6" 8"	24 °C - 250 °C	N₂

Techniques

Thermal ALD

Technique Tabs