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Lesker2 Sputter (lesker2-sputter)



Lesker2 is a load locked single wafer metal sputter providing semi-clean processing options for semi-clean compatible materials. The eight gun magnetron Lesker is classified as semi-clean and provides non-directional thin film (< 1 um)


Capabilities and Specifications

Material Thickness Range: - 1.0 μm
Process Temperature Range: 
°C - 800 °C
Maximum Load: 
one 4 inch wafer, one 6 inch wafer

reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter

Lab Organization, Location, and NEMO Information

Lab Organization: 
NEMO Area: 
nSiL: Cleanroom

Training and Maintenance

Lab Facility: 
Training Charges: 
1.00 hours
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Study the relevant operating procedures:
  2. Check the SNF Training Calendar for any scheduled training.

A shadowing session is recommended but not required. Only a training with tool owner is required. Training sessions are scheduled for 10:30am on the 1st Wednesday of the month. This training will qualify you for both Lesker sputtering systems. Review...

Operating Instructions