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Equipment name & NEMO ID Training Required & Charges Cleanliness Location Notes
AJA2 Evaporator
aja2-evap 		Evaporator AJA2 Training Flexible SNF Paul G Allen L107 Cleanroom

For more than 300nm deposition, please contact Gabe Catalano <gcatalano@stanford.edu> in advance
Heidelberg MLA 150 - 2
heidelberg2 		Heidelberg Training "All" SNF Paul G Allen L107 Cleanroom

Direct Write
Lesker2 Sputter
lesker2-sputter 		Sputter Lesker 1&2 Training Semiclean SNF Paul G Allen L107 Cleanroom

reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
Nanospec 3
nanospec3 		Nanospec 3 Training "All" SNF Paul G Allen L107 Cleanroom
Sensofar S-neox
s-neox 		Sensofar S-neox Training "All" SNF Paul G Allen L107 Cleanroom

non contact 3D optical profiling
Equipment name & NEMO ID Technique Cleanliness Material Thickness Range Materials Lab Supplied Minimum Resolution Exposure Wavelength Process Temperature Range Gases Substrate Size Substrate Type Maximum Load
AJA2 Evaporator
aja2-evap
Flexible
0.00 - 300.00 nm
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(Ge)
,
(Various)
 4"x3 or 6"x1 wafers or pieces
Heidelberg MLA 150 - 2
heidelberg2
"All"
375 nm
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(SiC)
,
(GaN)
,
(III-V)
,
(GaAs)
,
(Various)
,
(Various)
,
(LiNb)
 1
Lesker2 Sputter
lesker2-sputter
Semiclean
1.00 μm
°C - 800 °C
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(SiC)
,
(GaN)
,
(III-V)
,
(GaAs)
 one 4 inch wafer, one 6 inch wafer
Nanospec 3
nanospec3
"All"
Sensofar S-neox
s-neox
"All"
(Si)
,
(SiGe)
,
(SiO2)
,
(Al2O3)
,
(SiO2)
,
(Ge)
,
(GaN)
,
(III-V)
,
(GaAs)
 1