Chemical Formula:
Ge
Germanium can be deposited in single crystal layers using the Epi or poly crystal layers using the LPCVD furnaces.
Germanium can be deposited in single crystal layers using the Epi or poly crystal layers using the LPCVD furnaces.
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
AMAT Centurion Epitaxial System epi2 |
SNF Paul G Allen L107 Cleanroom |
50.00 Å -
3.00 μm
|
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
AJA Evaporator aja-evap |
SNF Exfab Paul G Allen 155A Venice |
0.00 -
300.00 nm
|
||
|
AMAT Centurion Epitaxial System epi2 |
SNF Paul G Allen L107 Cleanroom |
50.00 Å -
3.00 μm
|
||
|
Intlvac Evaporator Intlvac_evap |
SNF Paul G Allen L107 Cleanroom |
0.00 -
0.50 μm
|
||
|
Lesker Sputter lesker-sputter |
SNF Exfab Paul G Allen 155A Venice | |||
|
Lesker2 Sputter lesker2-sputter |
SNF Paul G Allen L107 Cleanroom |
1.00 μm
|
||
|
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched |
|---|---|---|---|---|
|
Lam Research TCP 9400 Poly Etcher lampoly |
SNF Paul G Allen L107 Cleanroom | |||
|
MRC Reactive Ion Etcher mrc |
SNF Paul G Allen L107 Cleanroom |
|
||
|
Xactix Xenon Difluoride Etcher xactix |
SNF Paul G Allen L107 Cleanroom |
|