Overview

Tystar 4600 Mini Bank 1Tube 4 Poly is a Low pressure Chemical vapor Deposition (LPCVD) Tube and offer processes such as:

  •  Polysilicon
  •  Amorphous Silicon
  •  Phosporous and Boron Doping
  •  Silicon Germanium
Cleanliness: 
Flexible

Processing Technique(s)

Capabilities and Specifications

Lab Supplied Materials

Poly Si
Silicon Germanium
Silicon
Germanium

Material Thickness Range:

25.0
Å
2.0
μm

Process Temperature Range:

420 °C - 630 °C

Substrate Sizes

4 inch wafer
6 inch wafer
Maximum Load: 
100

Lab Organization, Location, and NEMO Information

Lab Organization: 

Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)

Location: 
SNF Paul G Allen L107 Cleanroom
NEMO Area: 
SNF: Chemical Vapor Deposition
NEMO ID: 
B1T3 Flexible Poly

Training and Maintenance

Lab Facility: 
SNF Cleanroom
Training Charges: 
2.00 hours
Primary Trainer: 
Neel Mehta
Backup Trainer(s): 
Saeed Nejad
Primary Maintenance: 
Saeed Nejad
Backup Maintenance: 
Neel Mehta

Steps to become a tool user

  1. Become a member of nano@stanford.

  2. Become a member of SNF.

  3. Study the relevant operating procedures:
  4. Contact the primary trainer: Neel Mehta

  5. Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF

  6. Contact the primary trainer: Neel Mehta