Chemical Formula:
SiH4
No equipment matches all of the filter criteria you have set above.
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Aixtron MOCVD - III-N system aix-ccs |
SNF MOCVD Paul G Allen 213XA |
0.00 -
5.00 μm
|
||
|
Aixtron MOCVD - III-V system aix200 |
SNF MOCVD Paul G Allen 213XA |
0.00 -
5.00 μm
|
||
|
AMAT Centurion Epitaxial System epi2 |
SNF Paul G Allen L107 Cleanroom |
50.00 Å -
3.00 μm
|
||
|
Oxford Plasma Pro PECVD Ox-PECVD |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
PlasmaTherm Versaline HDP CVD System hdpcvd |
SNF Paul G Allen L107 Cleanroom |
500.00 Å -
4.00 μm
|
||
|
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|
||
|
Tystar Bank 1 Tube 4 LTO B1T4 Flexible LTO |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|
||
|
Tystar Bank 2 Tube 8 LTO B2T8 Clean LTO |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|
||
|
Tystar Bank 3 Tube 12 Poly B3T12 Clean Poly |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|