Skip to content Skip to navigation

Aluminum Arsenide

Chemical Formula: 

Below is listed the equipment where you can deposit (sorted by deposition method) and etch it, as well as interesting fab documentation regarding your material.

Equipment Tabs

Deposition Equipment
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Location Material Thickness Range Approved Materials supplied by Lab
Aixtron MOCVD - III-V system
SNF MOCVD Paul G Allen 213XA
0.00 - 5.00 μm
Subscribe to