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Stanford Nanofabrication Facility
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Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
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Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
SPF Measurement Bench ()
Processing Technique(s)
Characterization
Lab Organization, Location, and NEMO Information
Lab Organization:
System Prototyping Facility (SNF SPF)
Location:
SNF SPF Paul G Allen 138 SPF
Training and Maintenance
Lab Facility:
SNF SPF
Primary Trainer:
Mary Tang
Primary Maintenance:
Mary Tang
Steps to become a tool user
Become a
member of SNF
.
Become a
member of SNF SPF
.
Contact the primary trainer:
Mary Tang