Oxidation and Annealing Equipment Summary
Oxidation and Annealing Equipment Summary
| Equipment Name | Cleanliness | Material Thickness Range | Cleaning Required | Substrate Size | Maximum Load | Process Temperature Range | Gases |
|---|---|---|---|---|---|---|---|
| RTA AllWin 610 (aw610_r) | Flexible |
|
21 °C - 1150 °C
|
||||
| RTA AllWin 610 (aw610_l) | Clean |
|
Pre-Diffusion Clean | 1 wafer |
21 °C - 1150 °C
|
Last modified: 30 Apr 2020
