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Aixtron Black Magic graphene CVD furnace (aixtron-graphene)


CVD-Graphene The Aixtron Black Magic CVD furnace is dedicated to graphene synthesis and can accommodate multiple pieces or a single 4" wafer, with methane and hydrogen available as process gases. Process recipes have been optimized and are available to the user for the following: Cu foil (available from SNF stockroom or provided by the user), Cu-coated substrates, and Ni substrates. The recipes on Cu have been characterized to give excellent monolayer coverage with minimal areas of bilayers and low defectivity. Ni substrates will give multi-monolayer growth.


Capabilities and Specifications

Material Thickness Range: Å nm
Process Temperature Range: 
800 °C - 1100 °C
Maximum Load: 
1x4" wafer or Copper/Nickel foil

Lab Organization, Location, and NEMO Information

Lab Organization: 
NEMO Area: 
nSiL: Cleanroom

Training and Maintenance

Lab Facility: 
Training Charges: 
1.00 hours
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Study the relevant operating procedures:
  2. Contact the primary trainer: Swaroop Kommera

Operating Instructions