Aixtron Black Magic graphene CVD furnace (aixtron-graphene)
Overview
CVD-Graphene The Aixtron Black Magic CVD furnace is dedicated to graphene synthesis and can accommodate multiple pieces or a single 4" wafer, with methane and hydrogen available as process gases. Process recipes have been optimized and are available to the user for the following: Cu foil (available from SNF stockroom or provided by the user), Cu-coated substrates, and Ni substrates. The recipes on Cu have been characterized to give excellent monolayer coverage with minimal areas of bilayers and low defectivity. Ni substrates will give multi-monolayer growth.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lab Supplied Materials
Material Thickness Range: Å nm
Process Temperature Range:
800 °C - 1100 °C
Gases
Substrate Type
Substrate Sizes
Maximum Load:
1x4" wafer or Copper/Nickel foil
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
nSiL: Cleanroom
NEMO ID:
aixtron-graphene
Training and Maintenance
Lab Facility:
Training Charges:
1.00 hours
Primary Trainer:
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Contact the primary trainer: Swaroop Kommera
