Chemical Formula:
78% N2, 21% O2, ~1% Ar
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched | Gases |
|---|---|---|---|---|---|
|
Plasmaetch PE-50 plasma-etch |
SNF Exfab Paul G Allen 155A Venice |
|
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
SNF Exfab Paul G Allen L119 Año Nuevo |