Air

Chemical Formula:

78% N₂, 21% O₂, ~1% Ar

Gases Equipment Tabs

Etch Equipment Table

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched	Gases
Plasmaetch PE-50 plasma-etch	Flexible	SNF Exfab Paul G Allen 155 Mavericks	Resist		78% N₂, 21% O₂, ~1% Ar

Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Aixtron Black Magic graphene CVD furnace aixtron-graphene	Flexible	SNF Exfab Paul G Allen L119 Año Nuevo		C