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Air

Chemical Formula: 
78% N2, 21% O2, ~1% Ar

Gases Equipment Tabs

Etch Equipment Table
Partial words okay.
Etch Equipment
Equipment name & Badger ID Cleanliness Location Primary Materials Etched Other Materials Etched Gases
Plasmaetch PE-50
plasma-etch
SNF Exfab Paul G Allen 155 Mavericks
Anneal/Oxidation Equipment Table
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Location Material Thickness Range Approved Materials supplied by Lab
Aixtron Black Magic graphene CVD furnace
aixtron-graphene
SNF Exfab Paul G Allen L119 Año Nuevo
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