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Air
Chemical Formula:
78% N
2
, 21% O
2
, ~1% Ar
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
Plasmaetch PE-50
plasma-etch
Flexible
SNF Exfab Paul G Allen 155 Mavericks
Resist
78% N
2
, 21% O
2
, ~1% Ar
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Aixtron Black Magic graphene CVD furnace
aixtron-graphene
Flexible
SNF Exfab Paul G Allen L119 Año Nuevo
C