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Methane

Chemical Formula:

CH₄

Gases Equipment Tabs

Etch Equipment Table

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched	Gases
Oxford III-V etcher Ox-35	Flexible	SNF Paul G Allen L107 Cleanroom	GaAs	AlGaN AlInP GaN InGaP InSb	Ar BCl₃ CH₄ Cl₂ H₂ HBr N₂ O₂ SF₆
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL	Flexible	SNF Paul G Allen L107 Cleanroom	Metals or metal compounds with volatile byproducts Al	GaN	Ar BCl₃ CF₄ CH₄ Cl₂ N₂ O₂ SF₆

Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Aixtron Black Magic graphene CVD furnace aixtron-graphene	Flexible	SNF Exfab Paul G Allen L119 Año Nuevo		C
First Nano carbon nanotube CVD furnace cvd-nanotube	Flexible	SNF Exfab Paul G Allen L119 Año Nuevo		C
PlasmaTherm Shuttlelock PECVD System ccp-dep	All	SNF Paul G Allen L107 Cleanroom	100.00 Å - 4.00 μm	Si Si3N4 SiC SiO₂ SiON