First Nano carbon nanotube CVD furnace (cvd-nanotube)
Overview
CVD-Nanotube The First Nano CVD furnace is dedicated to carbon nanotube synthesis and can accommodate multiple pieces or a 4" wafer. Methane, hydrogen and ethanol are available as process gases and thus provide versatility for both SWCNT growth as well as vertical forest growth. Process recipes for horizontally aligned SWCNT growth on ST-cut quartz (available from the SNF stockroom) have been optimized and are available to the user, with typical yields of 1-5 SWCNTs per micron depending on the catalyst used.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lab Supplied Materials
Material Thickness Range: Å nm
Process Temperature Range:
800 °C - 1100 °C
Gases
Substrate Type
Substrate Sizes
Maximum Load:
1x4" wafer or multiple pieces
Notes:
Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
nSiL: Cleanroom
NEMO ID:
cvd-nanotube
Training and Maintenance
Lab Facility:
Training Charges:
3.00 hours
Primary Trainer:
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Contact the primary trainer: Neel Mehta
