Overview

CVD-Nanotube The First Nano CVD furnace is dedicated to carbon nanotube synthesis and can accommodate multiple pieces or a 4" wafer. Methane, hydrogen and ethanol are available as process gases and thus provide versatility for both SWCNT growth as well as vertical forest growth. Process recipes for horizontally aligned SWCNT growth on ST-cut quartz (available from the SNF stockroom) have been optimized and are available to the user, with typical yields of 1-5 SWCNTs per micron depending on the catalyst used.

Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Lab Supplied Materials

Material Thickness Range:

Å
nm

Process Temperature Range:

800 °C - 1100 °C

Substrate Sizes

Maximum Load: 
1x4" wafer or multiple pieces
Notes: 

Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density

Lab Organization, Location, and NEMO Information

Lab Organization: 

SNF Exfab

NEMO Area: 
NEMO ID: 
cvd-nanotube

Training and Maintenance