PROM Request Title: 
H2 Anneal in CVD Nano Tube Tool of Silicon for Smoothing Sidewall Scallops Formed During Bosch Process Deep Silicon Etch
PROM Request Summary: 
Request to create Si smoothing process in CNT furnace (similar to Epi process but in contamintated category furnace).
PROM Date: 
03/14/2016 (all day)
PROM Decision: 
Approved.
Link to PROM Request and supporting documentation: 
H2 Anneal in CVD Nano Tube Tool of Silicon for Smoothing Sidewall Scallops Formed During Bosch Process Deep Silicon Etch
Equipment List: 
First Nano carbon nanotube CVD furnace (cvd-nanotube)