Critical Point Dryer Tousimis Automegasamdri-936 (cpd)
Overview
The Automegasamdri®-936 Critical Point Drying (CPD) tool is used for carbon dioxide (CO2) drying after release of bulk or surface micromachined devices. Critical point drying is an efficient method of drying delicate samples without damaging it's structure by surface tension that occurs when changing from the liquid to the gaseous phase. The release is usually performed by immersion of the device in hydrofluoric acid followed by subsequent immersions in several beakers of DI water. The CPD requires that the device be completely free of acid or water before introducing it to the chamber. To avoid this, the device should be placed in isopropyl alcohol for at least one hour.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Chemicals
Substrate Type
Substrate Sizes
Notes:
CO2 drying after release of micromachined devices
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Wet Benches
NEMO ID:
cpd
Training and Maintenance
Lab Facility:
Training Charges:
2.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Uli Thumser
