Singe

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Wafer Prime (HMDS), Singe	HMDS Vapor Prime Oven, YES yes	YES oven: Wafer singe at 150ºC and HMDS prime.	All	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Chemicals	Substrate Size	Process Temperature Range	Notes
Wafer Prime (HMDS), Singe	HMDS Vapor Prime Oven, YES yes	All	[(CH₃)₃Si]₂NH	Pieces 2" 3" 4" 6"	150 ºC	Two programs: Singe and HMDS prime or Singe only. No Resist allowed!