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Pre-LPCVD or Pre-Metal Clean

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing	Wet Bench Clean 1 wbclean-1	Wet Bench Clean-1 and 2 is used for RCA cleaning 3", 4", and 6" silicon, silicon germanium, or quartz wafers which are in the 'clean' cleanliness group.	Clean	SNF Cleanroom Paul G Allen L107
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing	Wet Bench Clean 2 wbclean-2	Wet Bench Clean-1 and 2 is used for RCA cleaning 3", 4", and 6" silicon, silicon germanium, or quartz wafers which are in the 'clean' cleanliness group.	Clean	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Chemicals	Substrate Size	Maximum Load (number of wafers)	Notes
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing	Wet Bench Clean 1 wbclean-1	Clean	50:1 HF SC1 SC2	3" 4" 6"	25	No resist allowed. Resist should have been removed at the wbclean_res-piranha.
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing	Wet Bench Clean 2 wbclean-2	Clean	50:1 HF 6:1 BOE SC1 SC2	3" 4" 6"	25	No resist allowed. Resist should have been removed at the wbclean_res-piranha