Processing Technique Equipment name & NEMO ID Cleanliness Chemicals Substrate Size Maximum Load (number of wafers) Notes Stylus Tip Radius
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing Wet Bench Clean 1
wbclean-1 		Clean
25

No resist allowed. Resist should have been removed at the wbclean_res-piranha.
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing Wet Bench Clean 2
wbclean-2 		Clean
25

No resist allowed. Resist should have been removed at the wbclean_res-piranha