Resist Post Bake

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Resist Post Bake	Oven 110°C post-bake oven110	The 110°C Oven bakes the wafers with resist at 110ºC after the development, called post-bake.	All	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Substrate Size	Process Temperature Range	Notes
Resist Post Bake	Oven 110°C post-bake oven110	All	Pieces 2" 3" 4" 6"	110 ºC	Bakes wafers with resist after the development, called post-bake.