Resist as mask allowed
Pieces need a carrier wafer; Isotropic Etching
Manual solvent cleaning, two ultrasonic baths.
Two programs: Singe and HMDS prime or Singe only. No Resist allowed!
Manual solvent cleaning, hot plate
For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.
KOH or wafersaw or post-cmp decontamination
Convection in N2. Cure. Programmable.
Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal.
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.
Bakes wafers with resist after the development, called post-bake.