Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
Ex Fab Develop Wet Bench wbexfab_dev |
WbExfab_Dev Training | Flexible | SNF Exfab Paul G Allen 104 Stinson |
Manual development of resist in beakers. SNF approved developers only. No solvents! |
Ex Fab Solvent Wet Bench wbexfab_solv |
WbExfab_Solv Training | Flexible | SNF Exfab Paul G Allen 104 Stinson | |
Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls |
Malvern Dynamic Light Scattering (DLS) Zetasizer Training | Flexible | SNF Exfab Paul G Allen 155 Mavericks | |
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Parylene Coater Training | Flexible | SNF Exfab Paul G Allen 155 Mavericks | |
Samco PC300 Plasma Etch System samco |
Samco Training | Flexible | SNF Cleanroom Paul G Allen L107 |
Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Materials Lab Supplied | Developer | Process Temperature Range | Chemicals | Gases | Accessories Available | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Ex Fab Develop Wet Bench wbexfab_dev |
Flexible | ||||||||||||
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | ||||||||||||
Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls |
Flexible |
Integrating Sphere |
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PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Flexible |
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Samco PC300 Plasma Etch System samco |
Flexible |
20 ºC
|
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Four 4" wafers or two 6" wafers and one 8" wafer |