6 in wafer

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Notes
SEM -Zeiss Merlin sem-merlin	SEM-Merlin Training	All	SNF Exfab Paul G Allen 104 Stinson

Equipment name & NEMO ID	Technique	Cleanliness	Material Thickness Range	Sample Size Limits	Substrate Size	Substrate Type
SEM -Zeiss Merlin sem-merlin	Characterization > Surface Analysis > Microscopy	All	0.00 mm - 35.00 mm	6 in wafer	Pieces 2" 3" 4" 6" Disks	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs) , (LiNb)