Two programs: Singe and HMDS prime or Singe only. No Resist allowed!
Restricted to non-conductive films only
KOH or wafersaw or post-cmp decontamination
For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.
Convection in N2. Cure. Programmable.
Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal.
Resist will be removed
Bakes wafers with resist after the development, called post-bake.
No resist allowed. Resist should have been removed at the wbclean_res-piranha
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.
Bakes wafers after resist coating.
Automatic development.
