Wet Bench Flexcorr 3 wbflexcorr-3 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed. |
Karl Suss MA-6 Contact Aligner karlsuss |
Contact Aligner Karl Suss MA-6 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
1:1 Contact Aligner.
Backside align, including IR. |
AJA2 Evaporator aja2-evap |
Evaporator AJA2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
For more than 300nm deposition, please contact Gabe Catalano <gcatalano@stanford.edu> in advance |
Wet Bench Flexible Solvents wbflexsolv |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning of substrates or resist removal. |
ASML PAS 5500/60 i-line Stepper asml |
Stepper ASML PAS 5500/60 i-line Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
5:1 reducing stepper |
Fiji 2 ALD fiji2 |
ALD Fiji 1 and 2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
|
Critical Point Dryer Tousimis Automegasamdri-936 cpd |
Critical Point Dryer Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
CO2 drying after release of micromachined devices |
Savannah ALD savannah |
ALD Savannah Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
|
Matrix Plasma Resist Strip matrix |
Matrix Plasma Resist Strip Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating. |
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance |
Woollam woollam |
Woollam Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
|
Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces |
Sensofar S-neox s-neox |
Sensofar S-neox Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
non contact 3D optical profiling |
Oxford Plasma Pro ICP-RIE ALE Ox-ALE |
Oxford Plasma Pro ICP-RIE ALE Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
|
Oxford Dielectric Etcher oxford-rie |
Oxford Dielectric Etcher Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers |
Oxford Plasma Pro PECVD Ox-PECVD |
Oxford Plasma Pro PECVD Training |
Semiclean, Flexible |
SNF Paul G Allen L107 Cleanroom |
|
Headway Manual Resist Spinner headway2 |
Resist Coat (manual) Headway Manual Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
SVG Develop Track 1 svgdev |
SVG Resist Develop tracks 1 and 2 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Automatic development. |
EVG 101 Spray Coater evgspraycoat |
Spray Coater EVG 101 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Spray coating of resists |
Flexus 2320 Stress Tester stresstest |
Stress Tester Flexus 2320 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
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