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Stanford Nanofabrication Facility
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Fab Project Courses: E241 & EE412
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Device Process Courses: EE410 and EE312
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SNF Lab Manual, link to google doc
SNF Lab Manual
SNF Lab Manual
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Gowning lab specific
Garment checkout for Cleanroom L107
Gowning Procedure for Cleanroom L107
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
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Overview/Equipment List
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All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
"All" List of Tools
"Clean" List of Tools
"Clean-Ge" List of Tools
"Clean (MOCVD)" List of Tools
"Semiclean" List of Tools
"Flexible" List of Tools
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
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Bases
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Other Chemicals
Primer
Resists
Solvents
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Gases List
Useful Links
Run NEMO (login required)
NEMO User Guide
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Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
Tool Monitoring
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For Emergencies
Staff List
Consultants
Process Staff Liaisons
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
MOCVD Equipment
ALD Equipment
PECVD Equipment
LPCVD Equipment
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
RIE Etchers
Vapor Etchers
CCP Etchers
Downstream Plasma Etchers
ICP Etchers
Legacy Dry Etch Equipment Overview
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Lithography Oven Equipment
Resist Coat Equipment
Resist Develop Equipment
Resist Exposure Equipment
Wet Chemical Processing (link to Processing Techniques)
Materials
Section Menu
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Overview
Chemicals & Materials
Cleanliness Groups
"All" List of Tools
"Clean" List of Tools
"Clean-Ge" List of Tools
"Clean (MOCVD)" List of Tools
"Semiclean" List of Tools
"Flexible" List of Tools
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
Acids
Bases
Developers
Metal Etchants
Other Chemicals
Primer
Resists
Solvents
Substrate Types and Sizes
Materials List
Gases List
Germanium Antimony Tellurium
Chemical Formula:
GeSbTe
Deposition Equipment
Equipment name or NEMO ID
Partial words okay.
Deposition Equipment
Equipment name & NEMO ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Lesker Sputter
lesker-sputter
Flexible
SNF Exfab Paul G Allen 155A Venice
Ag
Al
Al
2
O
3
AlSi
Au
Co
Cr
Cu
Fe
In
x
Sn
y
O
z
Nb
Ni
Pd
Si
SiO
2
Ta
Ti
TiN
W
