Graphene CVD Growth |
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
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Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Metal-Organic (MO) CVD |
Aixtron MOCVD - III-N system aix-ccs |
Aixtron MOCVD for III-N semiconductors: InN, GaN, AlN, InGaN, InAlN, AlGaN, InGaAlN. Aix-ccs is a vertical metal organic chemical vapor deposition (MOCVD) system.
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Clean (MOCVD) |
SNF MOCVD Paul G Allen 213XA |
Metal-Organic (MO) CVD |
Aixtron MOCVD - III-V system aix200 |
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Flexible |
SNF MOCVD Paul G Allen 213XA |
Evaporation |
AJA Evaporator aja-evap |
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Flexible |
SNF Exfab Paul G Allen 155A Venice |
Evaporation |
AJA2 Evaporator aja2-evap |
This E-beam evaporator can evaporate a variety of metals (no oxides) onto your substrates. It has an integrated ion mill for substrate precleaning.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
EPI (CVD), Low Pressure (LP) CVD, Hydrogen (H2) Annealing, Doping, Plasma Enhanced (PE) CVD |
AMAT Centurion Epitaxial System epi2 |
Deposit epitaxial and polycrystalline silicon, germanium and silicon-germanium films.
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Clean |
SNF Cleanroom Paul G Allen L107 |
Evaporation |
CHA Solutions II Evaporator cha-evap |
cha-evap is a non-load locked e-beam evaporator designed for higher throughput.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Plasma Enhanced (PE) ALD |
Fiji 1 ALD fiji1 |
Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system.
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Semiclean |
SNF Cleanroom Paul G Allen L107 |
Plasma Enhanced (PE) ALD |
Fiji 2 ALD fiji2 |
Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Fiji2 is currently classified as Flexible and is open to a wide range of metals and dielectrics.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Plasma Enhanced (PE) ALD |
Fiji 3 ALD fiji3 |
The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma enabled atomic layer deposition system for deposition of restricted oxide films. The system is in the Flexible cleanliness category and allows a limited subset of gold contaminated substrates.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Carbon Nanotube CVD Growth |
First Nano carbon nanotube CVD furnace cvd-nanotube |
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Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Ink |
Fujifilm Dimatix Ink Jet Printer nanoinkjet |
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Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Sputtering |
Hummer V Sputter Coater hummer |
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Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Evaporation |
Intlvac Evaporator Intlvac_evap |
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Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
Sputtering |
Lesker Sputter lesker-sputter |
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Flexible |
SNF Exfab Paul G Allen 155A Venice |
Sputtering |
Lesker2 Sputter lesker2-sputter |
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Semiclean |
SNF Cleanroom Paul G Allen L107 |
Thermal ALD |
MVD mvd |
MVD is a molecular vapor deposition (MVD) system. It is a self assembling monolayers (SAMs)-based configuration of a Savannah S200 from Cambridge Nanotech with 1 SAMs delivery port and 4 standard atomic layer deposition (ALD) lines. The system can accommodate pieces up to an 8" wafer.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Ink |
Optomec Printer optomec-printer |
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Flexible |
SNF Exfab Paul G Allen 155A Venice |
Deposition |
PDMS Workbench |
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Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Deposition |
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
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Flexible |
SNF Exfab Paul G Allen 155 Mavericks |