The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Flexible" category.
Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Material Thickness Range | Materials Lab Supplied | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
Flexible |
800 °C - 1100 °C
|
, |
1x4" wafer or Copper/Nickel foil | ||||||||
Aixtron MOCVD - III-V system aix200 |
Pre-Diffusion Clean | Flexible |
0.00 -
5.00 μm
|
300 °C - 800 °C
|
, , , |
4"x1 wafer or 2"x1 wafer or 4 pieces | ||||||
AJA Evaporator aja-evap |
Flexible |
0.00 -
300.00 nm
|
, , , , , , , , , , , |
4"x3 or 6"x1 wafers or pieces | ||||||||
AJA2 Evaporator aja2-evap |
Flexible |
0.00 -
300.00 nm
|
, , , , , |
4"x3 or 6"x1 wafers or pieces | ||||||||
Alveole Primo alveole |
Flexible | |||||||||||
Asylum AFM afm-asylum |
Flexible | |||||||||||
Biologic SP-300 biologic |
Flexible | |||||||||||
CMP GnP POLI-400L cmp |
Flexible | |||||||||||
Critical Point Dryer Tousimis Automegasamdri-915B cpd |
Flexible |
, , , , , , , , , |
||||||||||
CytoViva HSI cytoviva |
Flexible | |||||||||||
DISCO Backgrinder disco-backgrind |
Flexible | |||||||||||
DISCO Wafer Saw DISCO wafersaw |
Flexible |
, , , , , , , |
1x4", 1x6" or 1x8" wafer, or pieces | |||||||||
Epilog Fusion M2 Laser Cutter lasercutter |
Flexible | |||||||||||
EVG Wafer Bonder evbond |
Flexible |
, , , , , |
||||||||||
Ex Fab Develop Wet Bench wbexfab_dev |
Flexible | |||||||||||
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | |||||||||||
Fiji 2 ALD fiji2 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
, , , , , , , , , , , , |
||||||||
Fiji 3 ALD fiji3 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
, , |
||||||||
Finetech Lambda flipchipbonder |
Flexible |
°C - 400 °C
|
, , , , , |
1 | ||||||||
First Nano carbon nanotube CVD furnace cvd-nanotube |
Flexible |
800 °C - 1100 °C
|
, |
1x4" wafer or multiple pieces |