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Critical Point Dryer Tousimis Automegasamdri-915B (cpd) |
CO2 Drying, Wet Chemical Processing |
CO2 (liquid) |
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Flexible |
CO2 drying after release of micromachined devices
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Ex Fab Solvent Wet Bench (wbexfab_solv) |
Solvent Cleaning, Metal Lift-off, Wet Chemical Processing |
Solvents |
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Flexible |
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Mask Scrubber (masksrub) |
Mask Cleaning (manual), Wet Chemical Processing |
DI Water |
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All |
5 inch mask cleaning, water under pressure, no chemicals
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Wet Bench Clean 1 (wbclean-1) |
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing |
50:1 Hydrofluoric Acid, Standard Clean 1, Standard Clean 2 |
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Clean |
No resist allowed. Resist should have been removed at the wbclean_res-piranha.
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Wet Bench Clean 2 (wbclean-2) |
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing |
6:1 Buffered oxide etch, 50:1 Hydrofluoric Acid, Standard Clean 1, Standard Clean 2 |
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Clean |
No resist allowed. Resist should have been removed at the wbclean_res-piranha
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Wet Bench Clean_res- hotphos (wbclean_res-hotphos) |
Silicon Nitride Wet Etching, Wet Chemical Processing |
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Silicon Nitride |
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Clean |
Resist should have been removed
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Wet Bench Clean_res-hf (wbclean_res-hf) |
Silicon Oxide Wet Etching, Wet Chemical Processing |
20:1 Buffered oxide etch, 6:1 Buffered oxide etch, 50:1 Hydrofluoric Acid |
Silicon Dioxide |
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Clean |
Resist as mask allowed
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Wet Bench Clean_res-piranha (wbclean_res-piranha) |
Piranha Cleaning, Wet Resist Removal, Wet Chemical Processing |
9:1 Piranha Solution |
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Clean |
Resist will be removed
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Wet Bench CMOS Metal (wbclean3) |
Aluminum and Titanium and Tungsten Wet Etching, Wet Chemical Processing |
20:1 Buffered oxide etch, 6:1 Buffered oxide etch, 50:1 Hydrofluoric Acid, Aluminum Etchant, Titanium (Ti) etchant Peroxide-based, Tungsten (W) etchant Peroxide-based |
Aluminum, Titanium, Tungsten |
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Semiclean |
Al, Ti, or W wet etching or oxide etching
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Wet Bench Decontamination (wbdecon) |
Decontamination, Wet Chemical Processing |
Standard Clean 2 |
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Clean |
KOH or wafersaw or post-cmp decontamination
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Wet Bench Flexcorr 1 (wbflexcorr-1) |
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing |
Acids, 20:1 Buffered oxide etch, 6:1 Buffered oxide etch, 9:1 Piranha Solution, 50:1 Hydrofluoric Acid, Standard Clean 1, Standard Clean 2, Aluminum Etchant, Chromium Etchant, Gold Etchant, Bases, Potassium Hydroxide 45% |
Photoresist, Metals, Silicon Dioxide, Silicon, Aluminum, Chromium, Gold |
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Flexible |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
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Wet Bench Flexcorr 2 (wbflexcorr-2) |
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing |
Acids, Bases |
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Flexible |
Manual wet etching of non-standard materials. Hot pots available. GaAs allowed in personal labware only
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Wet Bench Flexcorr 3 (wbflexcorr-3) |
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing |
Acids, Bases |
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Flexible |
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.
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Wet Bench Flexcorr 4 (wbflexcorr-4) |
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing |
Acids, Bases |
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Flexible |
Manual wet etching of non-standard materials using acids or bases. Hot plate, HF bath, and controlled temperature bath available. GaAs not allowed.
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Wet Bench Flexible Solvents (wbflexsolv) |
Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Solvents |
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Flexible |
Manual solvent cleaning of substrates or resist removal.
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Wet Bench Flexible Solvents 1 (wbflexsolv-1) |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Solvents |
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Flexible |
Manual solvent cleaning, two ultrasonic baths.
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Wet Bench Flexible Solvents 2 (wbflexsolv-2) |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Solvents |
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Flexible |
Manual solvent cleaning, hot plate
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Wet Bench Miscellaneous (wbmiscres) |
Resist Develop (manual), Wet Chemical Processing |
Developers |
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Flexible |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!
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Wet Bench Resist Strip (wbresstrip-1) |
Wet Resist Removal, Wet Chemical Processing |
PRS-1000, SRS-100 |
Photoresist |
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Clean (Ge), Semiclean, Flexible |
Wet Resist Removal: SRS-100 or PRS1000
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Wet Bench Solvent Lithography (lithosolv) |
Solvent Cleaning, Wet Chemical Processing |
Solvents |
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Flexible |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.
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