Lakeshore Hall Measurement System
LakeshoreHall |
Lakeshore Hall Measurement System training |
"All" |
SNF Exfab Paul G Allen 151 Ocean |
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micromanipulator6000 IV-CV probe station
micromanipulator6000 |
micromanipulator6000 IV-CV probe station Training |
"All" |
SNF Exfab Paul G Allen 151 Ocean |
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LEI1500 Contactless Sheet Resistance Mapping
eddycurrent |
LEI1500 Contactless Sheet Resistance Mapping Training |
"All" |
SNF Exfab Paul G Allen 151 Ocean |
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Oven 90°C prebake
oven90 |
Resist Prebake Oven 90°C Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Bakes wafers after resist coating. |
Karl Suss MA-6 Contact Aligner
karlsuss2 |
Contact Aligner Karl Suss MA-6 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
1:1 Contact Aligner.
Backside align. |
Woollam
woollam |
Woollam Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
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Karl Suss MA-6 Contact Aligner
karlsuss |
Contact Aligner Karl Suss MA-6 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
1:1 Contact Aligner.
Backside align, including IR. |
Headway Manual Resist Spinner
headway2 |
Resist Coat (manual) Headway Manual Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
ASML PAS 5500/60 i-line Stepper
asml |
Stepper ASML PAS 5500/60 i-line Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
5:1 reducing stepper |
PlasmaTherm Shuttlelock PECVD System
ccp-dep |
PlasmaTherm Shuttlelock PECVD System Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing -
Substrates in clean category: Pre-Diffusion Clean
For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run |
Sensofar S-neox
s-neox |
Sensofar S-neox Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
non contact 3D optical profiling |
PlasmaTherm Versaline HDP CVD System
hdpcvd |
PlasmaTherm Versaline HDP CVD System Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
To maintain cleanliness level there are cleans required for both the chamber and wafers prior to processing -
Substrates in clean category: Pre-Diffusion Clean
For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run |
Prometrix Resistivity Mapping System
prometrix |
Prometrix Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
3 Probe Heads for different cleanliness groups. |
Xactix Xenon Difluoride Etcher
xactix |
Xactix Xenon Difluoride Etcher Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces |
Flexus 2320 Stress Tester
stresstest |
Stress Tester Flexus 2320 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
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SVG Develop Track 1
svgdev |
SVG Resist Develop tracks 1 and 2 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Automatic development. |
SVG Resist Coat Track 2
svgcoat2 |
SVG Resist Coat Tracks 1 and 2 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal. |
Laurell Manual Resist Spinner
laurell-R |
Laurell Manual Resist Spinner Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
SU-8, LOL, Ebeam resists allowed. No Acetone allowed. |
SVG Develop Track 2
svgdev2 |
SVG Resist Develop tracks 1 and 2 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Automatic development. |
EVG 101 Spray Coater
evgspraycoat |
Spray Coater EVG 101 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Spray coating of resists |
