Chemical Formula:
H2
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched | Gases |
|---|---|---|---|---|---|
|
Oxford III-V etcher Ox-35 |
SNF Paul G Allen L107 Cleanroom | ||||
|
Oxford Plasma Pro ICP-RIE Ox-gen |
SNF Paul G Allen L107 Cleanroom |
|
|
||
|
Oxford Plasma Pro ICP-RIE ALE Ox-ALE |
SNF Paul G Allen L107 Cleanroom | ||||
|
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox |
SNF Paul G Allen L107 Cleanroom |
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
SNF Exfab Paul G Allen L119 Año Nuevo | |||
|
Aixtron MOCVD - III-N system aix-ccs |
SNF MOCVD Paul G Allen 213XA |
0.00 -
5.00 μm
|
||
|
Aixtron MOCVD - III-V system aix200 |
SNF MOCVD Paul G Allen 213XA |
0.00 -
5.00 μm
|
||
|
AMAT Centurion Epitaxial System epi2 |
SNF Paul G Allen L107 Cleanroom |
50.00 Å -
3.00 μm
|
||
|
Fiji 1 ALD fiji1 |
SNF Paul G Allen L107 Cleanroom |
1.00 Å -
50.00 nm
|
||
|
Fiji 2 ALD fiji2 |
SNF Paul G Allen L107 Cleanroom |
1.00 Å -
50.00 nm
|
||
|
Fiji 3 ALD fiji3 |
SNF Paul G Allen L107 Cleanroom |
1.00 Å -
50.00 nm
|
||
|
First Nano carbon nanotube CVD furnace cvd-nanotube |
SNF Exfab Paul G Allen L119 Año Nuevo |