Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.
non contact 3D optical profiling
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance
Manual solvent cleaning of substrates or resist removal.
CO2 drying after release of micromachined devices
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
For more than 300nm deposition, please contact staff in advance.
