Quartz

Chemical Formula:

SiO2

Equipment Tables

Equipment name & NEMO ID	Technique	Cleanliness	Primary Materials Etched	Other Materials Etched	Chemicals	Substrate Size	Substrate Type	Maximum Load
Wet Bench Clean_res- hotphos wbclean_res-hotphos	Etching > Wet Etching > Silicon Nitride Wet Etching Wet Chemical Processing	Clean	Si3N4			3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2)
Wet Bench Clean_res-hf wbclean_res-hf	Etching > Wet Etching > Silicon Oxide Wet Etching Wet Chemical Processing	Clean	SiO₂		20:1 BOE 50:1 HF 6:1 BOE	3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2)
Wet Bench Clean_res-piranha wbclean_res-piranha	Cleaning > Piranha Cleaning Cleaning > Resist Removal > Wet Resist Removal Wet Chemical Processing	Clean			9:1 Piranha	3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2)
Wet Bench CMOS Metal wbclean3	Etching > Wet Etching > Aluminum and Titanium and Tungsten Wet Etching Wet Chemical Processing	Semiclean	Al Ti W		20:1 BOE 50:1 HF 6:1 BOE Al-Etch Ti-Etch W-etch	3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2)	25 wafers
Wet Bench Decontamination wbdecon	Cleaning > Decontamination Wet Chemical Processing	Clean			SC2	3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2)
Wet Bench Flexcorr 1 wbflexcorr-1	Cleaning > Decontamination Cleaning > Metal Clean Cleaning > Piranha Cleaning Cleaning > Resist Removal > Wet Resist Removal Etching > Wet Etching > Acid or Base Wet Etching Etching > Wet Etching > Aluminum and Titanium and Tungsten Wet Etching Etching > Wet Etching > Silicon Wet Etching Etching > Wet Etching > Silicon Oxide Wet Etching Wet Chemical Processing	Flexible	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Acids Bases Gold Etchant 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Pieces 2" 3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Silicon Carbide (SiC) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs) Polymer (Various)
Wet Bench Flexcorr 2 wbflexcorr-2	Etching > Wet Etching > Acid or Base Wet Etching Cleaning > Piranha Cleaning Wet Chemical Processing	Flexible			Acids Bases	Pieces 2" 3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Silicon Carbide (SiC) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs) Polymer (Various)
Wet Bench Flexcorr 3 wbflexcorr-3	Etching > Wet Etching > Acid or Base Wet Etching Cleaning > Piranha Cleaning Wet Chemical Processing	Flexible			Acids Bases	Pieces 2" 3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Silicon Carbide (SiC) Gallium Nitride (GaN) III-V (III-V) Polymer (Various)
Wet Bench Flexible Solvents wbflexsolv	Cleaning > Solvent Cleaning Cleaning > Resist Removal > Wet Resist Removal Patterning > Metal Lift-off	Flexible			Isopropanol Solvents	Pieces 2" 3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Silicon Carbide (SiC) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs) Polymer (Various)
Wet Bench Flexible Solvents 1 wbflexsolv-1	Cleaning > Solvent Cleaning Cleaning > Resist Removal > Wet Resist Removal Wet Chemical Processing	Flexible			Solvents	Pieces 2" 3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Silicon Carbide (SiC) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs) Polymer (Various)

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