Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
Fiji 1 ALD fiji1 |
ALD Fiji 1 and 2 Training | Semiclean | SNF Cleanroom Paul G Allen L107 | |
Fiji 2 ALD fiji2 |
ALD Fiji 1 and 2 Training | Flexible | SNF Cleanroom Paul G Allen L107 | |
Fiji 3 ALD fiji3 |
ALD Fiji 3 Training | Flexible | SNF Cleanroom Paul G Allen L107 |
Restricted to non-conductive films only |
MVD mvd |
MVD Training | Flexible | SNF Cleanroom Paul G Allen L107 |
Reactor located inside glovebox |
Savannah ALD savannah |
ALD Savannah Training | Flexible | SNF Cleanroom Paul G Allen L107 | |
AMAT Centurion Epitaxial System epi2 |
Epitaxial AMAT Centurion Training | Clean | SNF Cleanroom Paul G Allen L107 |
N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr |
PlasmaTherm Shuttlelock PECVD System ccp-dep |
PlasmaTherm Shuttlelock PECVD System Training | All | SNF Cleanroom Paul G Allen L107 |
To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing - Substrates in clean category: Pre-Diffusion Clean For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run |
PlasmaTherm Versaline HDP CVD System hdpcvd |
PlasmaTherm Versaline HDP CVD System Training | All | SNF Cleanroom Paul G Allen L107 |
To maintain cleanliness level there are cleans required for both the chamber and wafers prior to processing - Substrates in clean category: Pre-Diffusion Clean For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run |
Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Material Thickness Range | Materials Lab Supplied | Process Temperature Range | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|
AMAT Centurion Epitaxial System epi2 |
Pre-Diffusion Clean | Clean |
50.00 Å -
3.00 μm
|
600 °C - 1200 °C
|
1 | |||||
Fiji 1 ALD fiji1 |
Semiclean |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
, , |
||||||
Fiji 2 ALD fiji2 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
, , , , , , , , , , , , |
||||||
Fiji 3 ALD fiji3 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
, , |
||||||
MVD mvd |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 150 °C
|
|||||||
PlasmaTherm Shuttlelock PECVD System ccp-dep |
All |
100.00 Å -
4.00 μm
|
100 °C - 350 °C
|
, , , , , , , , |
4 | |||||
PlasmaTherm Versaline HDP CVD System hdpcvd |
All |
500.00 Å -
4.00 μm
|
50 °C - 150 °C
|
1 | ||||||
Savannah ALD savannah |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 250 °C
|
, , , , , , , , , , , , |