Short Name:
4"
The following is a list of equipment where 4 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Material Thickness Range | Materials Lab Supplied | Resist | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
EVG 101 Spray Coater evgspraycoat |
"All" | 1 | ||||||||||
|
Ex Fab Develop Wet Bench wbexfab_dev |
Flexible | |||||||||||
|
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | |||||||||||
|
Fiji 1 ALD fiji1 |
Semiclean |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
|||||||||
|
Fiji 2 ALD fiji2 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
|||||||||
|
Fiji 3 ALD fiji3 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
|||||||||
|
Filmetrics 4PP Filmetrics 4PP |
"All" | 1 | ||||||||||
|
Finetech Lambda flipchipbonder |
Flexible |
°C - 400 °C
|
1 | |||||||||
|
First Nano carbon nanotube CVD furnace cvd-nanotube |
Flexible |
800 °C - 1100 °C
|
1x4" wafer or multiple pieces | |||||||||
|
Flexus 2320 Stress Tester stresstest |
"All" | 1 |