The "All" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "All" category.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Material Thickness Range | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Resist | Developer | Process Temperature Range | Chemicals | Sample Size Limits | Resolution Notes | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
HMDS Vapor Prime Oven, YES2 yes2 |
"All" |
150 ºC
|
25 | |||||||||||||
|
Karl Suss MA-6 Contact Aligner karlsuss |
"All" |
|
365 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch | |||||||||||
|
Karl Suss MA-6 Contact Aligner karlsuss2 |
"All" |
|
365 nm or 405 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch | |||||||||||
|
Keyence Digital Microscope VHX-6000 keyence |
"All" | |||||||||||||||
|
Lakeshore Hall Measurement System LakeshoreHall |
"All" |
100.00 μm -
1000.00 μm
|
-258 °C - 1000 °C
|
8 in wafer |
Sensor Transducer Size is 14 mm diameter |
1 piece | ||||||||||
|
Laurell Manual Resist Spinner laurell-R |
"All" | |||||||||||||||
|
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
"All" | 8 in wafer |
Sensor Transducer Size is 14 mm diameter |
1 wafer(2" to 8") | ||||||||||||
|
Micromanipulator6000 IV-CV probe station micromanipulator6000 |
"All" | 1x4" wafer | ||||||||||||||
|
Nanospec 210XP nanospec2 |
"All" | |||||||||||||||
|
Nanospec 3 nanospec3 |
"All" |