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Tin Oxide
Chemical Formula:
SnO
2
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Fiji 2 ALD
fiji2
Flexible
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Metal oxides
Al
2
O
3
Ga
2
O
3
HfN
HfO
2
In
2
O
3
In
x
Sn
y
O
z
MoO
3
Ni
x
O
y
Pt
Ru
Si3N4
SiO
2
SnO
2
SrO
Ta
2
O
5
TiN
TiO
2
Various Dielectrics
ZrO
2
Savannah ALD
savannah
Flexible
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Metal oxides
Al
2
O
3
Al
x
Zn
y
O
x
Ga
2
O
3
HfO
2
SnO
2
TiO
2
Various Dielectrics
ZnO
3
ZrO
2
Etching Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
MRC Reactive Ion Etcher
mrc
Flexible
SNF Paul G Allen L107 Cleanroom
Metal oxides
Metals
Metals or metal compounds with volatile byproducts
Metals or metal compounds without volatile byproducts
Au
Ni
poly(p-xylylene)
Pt
Si
Si3N4
SiO
2
Ti
Various 2D Materials
Various Dielectrics
Various polymers
PI
Resist
Al
AlAs
AlGaAs
AlGaN
AlInP
AlN
AlSi
BiFeO
3
C
C
C
Co
CoFeB
Cr
Cu
Er
Fe
Ga
2
O
3
GaAs
GaN
GaP
GaPN
Ge
Hf
HfN
III-N materials
III-V materials
In
In
2
O
3
InAlN
InAs
InGaAlN
InGaAs
InGaAsN
InGaN
InGaP
InN
InP
InPN
InSb
Ir
LaB
6
LiNb
Nb
Ni
x
O
y
NiSi
Pd
Ru
Sc
SiC
SiGe
SiO
SiON
Sn
SnO
2
SrO
SrRuO
Ta
Ta
2
O
5
TaN
TiN
V
Various C-based
Various polymers
W
WO
3
WSi
2
Y
ZnO
3
Zr
ZrY
Alumina
AZO
Hafnia
ITO
LLZO
Moly
Moly Oxide
Poly Silicon
Ti Tungsten
Titania
YSZ
Zirconia
