The "All" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "All" category.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Minimum Resolution | Exposure Wavelength | Mask Size | Resist | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|---|
|
ASML PAS 5500/60 i-line Stepper asml |
"All" |
|
365 nm | 5 inch | |||||||
|
EVG 101 Spray Coater evgspraycoat |
"All" | 1 | |||||||||
|
Filmetrics 4PP Filmetrics 4PP |
"All" | 1 | |||||||||
|
Flexus 2320 Stress Tester stresstest |
"All" | 1 | |||||||||
|
Headway 3 Manual Resist Spinner headway3 |
"All" | 1 piece or wafer | |||||||||
|
Headway Manual Resist Spinner headway2 |
"All" | one piece or wafer | |||||||||
|
Heidelberg MLA 150 heidelberg |
"All" |
|
405 nm | 1 | |||||||
|
Heidelberg MLA 150 - 2 heidelberg2 |
"All" |
|
375 nm | 1 | |||||||
|
Heidelberg3 heidelberg3 |
"All" | 1 | |||||||||
|
HMDS Vapor Prime Oven, YES yes |
"All" |
150 ºC
|