Overview

Heidelberg3 is a table top direct write tool. The source is a 365nm LED source. The minimum feature size that it can write is 1um. The alignment accuracy is +/-1um. 

Cleanliness: 
"All"

Processing Technique(s)

Capabilities and Specifications

Substrate Sizes

Pieces
2 inch wafer
3 inch wafer
4 inch wafer
Maximum Load: 
1

Lab Organization, Location, and NEMO Information

Lab Organization: 

SNF Exfab

Location: 
SNF Exfab Paul G Allen L104 Stinson
NEMO Area: 
ExFab: L104 Stinson
NEMO ID: 
heidelberg3

Training and Maintenance

Lab Facility: 
SNF Exfab
Training Charges: 
2.00 hours
Primary Trainer: 
Swaroop Kommera
Primary Maintenance: 
Swaroop Kommera

Steps to become a tool user

  1. Become a member of nano@stanford.

  2. Become a member of SNF.

  3. "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.

  4. Contact the primary trainer.
    Please send the following information - substrate size and type, types of resists, resist thickness(es), minimum feature size, substrate relief (i.e., highest point – lowest point on substrate in the Z direction), Special situations - Whether you are planning to tape the substrate to another substrate etc

  5. Please read through the material on the website https://snfguide.stanford.edu/guide/equipment/heidelberg-mla-150-heidelberg The ones which are a must are
    a – quick operating instructions https://snfguide.stanford.edu/snf/operating-instructions/heidelberg-mla-...
    b – precautions - https://snfguide.stanford.edu/snf/operating-instructions/heidelberg-mla1...
    c – quick user guide https://drive.google.com/file/d/14-6XASdEgSdccNiVl4L-sUwdNLw0yLRE/view
    Please watch the training videos here https://www.youtube.com/playlist?list=PLaWbUJn2CJH-EBAyLsOjjrXAMUi5MQlXh

  6. Once you send me the information, read the materials and watched the videos, please shadow a user atleast 2 times. It is best to shadow a user who has similar substrate dimension as yours. After the first shadowing, please go through the reading material again. Please shadow twice. Once you have done the shadowing, please let me know. The next step would be tool training  session.