Wet Bench Flexcorr 1 (wbflexcorr-1)
Overview
The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or cleaning of SNF approved substrates or materials using only SNF approved acids or bases. GaAs processing is allowed but only in user provided labware. Solvents are not allowed!
Cleanliness:
Processing Technique(s)
- Etching > Wet Etching > Acid or Base Wet Etching
- Etching > Wet Etching > Aluminum and Titanium and Tungsten Wet Etching
- Cleaning > Decontamination
- Cleaning > Metal Clean
- Cleaning > Piranha Cleaning
- Etching > Wet Etching > Silicon Oxide Wet Etching
- Etching > Wet Etching > Silicon Wet Etching
- Wet Chemical Processing
- Cleaning > Resist Removal > Wet Resist Removal
Capabilities and Specifications
Primary Materials Etched
Other Materials Etched
Chemicals
Substrate Type
Substrate Sizes
Notes:
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Wet Benches
NEMO ID:
wbflexcorr-1
Training and Maintenance
Lab Facility:
Training Charges:
2.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- For upcoming training check the Training dashboard (login required).
- Contact the primary trainer: Uli Thumser
