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Stanford Nanofabrication Facility
Lab User Guide

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      • Fab Project Courses: E241 & EE412
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      • Device Process Courses: EE410 and EE312
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      • SNF Lab Manual
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    • Gowning Procedure for Cleanroom L107
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    • Overview/Equipment List
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    • All Litho class
  • Materials
    • Overview
      • Chemicals & Materials
    • Cleanliness Groups
      • "All" List of Tools
      • "Clean" List of Tools
        • "Clean-Ge" List of Tools
        • "Clean (MOCVD)" List of Tools
        • "Semiclean" List of Tools
      • "Flexible" List of Tools
    • New Process or Material Requests (PROM)
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        • TMAH Checklist
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    • Chemicals List
      • Acids
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      • Primer
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    • Substrate Types and Sizes
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  • Useful Links
    • Run NEMO (login required)
    • NEMO User Guide
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    • Wafer Dopant and Resistivity Specs
    • Face shield cleaning using steamer
    • Tool Monitoring
  • Emergency and People
    • For Emergencies
    • Staff List
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  • Equipment
    • Equipment Name Table
    • Characterization (link to Processing Techniques)
    • CVD (link to Processing Techniques)
      • MOCVD Equipment
      • ALD Equipment
      • PECVD Equipment
      • LPCVD Equipment
    • Doping (link to Processing Techniques)
    • Dry Etch (link to Processing Techniques)
      • RIE Etchers
      • Vapor Etchers
      • CCP Etchers
      • Downstream Plasma Etchers
      • ICP Etchers
      • Legacy Dry Etch Equipment Overview
    • Metallization (link to Processing Techniques)
    • Oxidation and Annealing (link to Processing Techniques)
    • Photolithography (link to Processing Techniques)
      • Lithography Oven Equipment
      • Resist Coat Equipment
      • Resist Develop Equipment
      • Resist Exposure Equipment
    • Wet Chemical Processing (link to Processing Techniques)

SNF: Photolithography

Equipment Tables

  • Summary
  • Specifications
Equipment name & NEMO IDsort descending Training Required & Charges Cleanliness Location Notes
ASML PAS 5500/60 i-line Stepper
asml
Stepper ASML PAS 5500/60 i-line Training "All" SNF Paul G Allen L107 Cleanroom

5:1 reducing stepper

EVG 101 Spray Coater
evgspraycoat
Spray Coater EVG 101 Training "All" SNF Paul G Allen L107 Cleanroom

Spray coating of resists

Headway Manual Resist Spinner
headway2
Resist Coat (manual) Headway Manual Training "All" SNF Paul G Allen L107 Cleanroom

Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists

HMDS Vapor Prime Oven, YES
yes
YES Prime Oven Training "All" SNF Paul G Allen L107 Cleanroom

Two programs: Singe and HMDS prime or Singe only. No Resist allowed!

Karl Suss MA-6 Contact Aligner
karlsuss2
Contact Aligner Karl Suss MA-6 Training "All" SNF Paul G Allen L107 Cleanroom

1:1 Contact Aligner. Backside align.

Karl Suss MA-6 Contact Aligner
karlsuss
Contact Aligner Karl Suss MA-6 Training "All" SNF Paul G Allen L107 Cleanroom

1:1 Contact Aligner. Backside align, including IR.

Laurell Manual Resist Spinner
laurell-R
Laurell Manual Resist Spinner Training "All" SNF Paul G Allen L107 Cleanroom

SU-8, LOL, Ebeam resists allowed. No Acetone allowed. 

Oven (White)
white-oven
White Oven Training Flexible SNF Paul G Allen L107 Cleanroom

For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.

Oven 110°C post-bake
oven110
Resist Postbake Oven 110°C Training "All" SNF Paul G Allen L107 Cleanroom

Bakes wafers with resist after the development, called post-bake.

Oven 90°C prebake
oven90
Resist Prebake Oven 90°C Training "All" SNF Paul G Allen L107 Cleanroom

Bakes wafers after resist coating.

Oven BlueM 200°C to 430°C
bluem
Blue M Oven Training Flexible SNF Paul G Allen L107 Cleanroom

Convection in N2. Cure. Programmable.

SVG Develop Track 1
svgdev
SVG Resist Develop tracks 1 and 2 Training "All" SNF Paul G Allen L107 Cleanroom

Automatic development.

SVG Develop Track 2
svgdev2
SVG Resist Develop tracks 1 and 2 Training "All" SNF Paul G Allen L107 Cleanroom

Automatic development.

SVG Resist Coat Track 1
svgcoat
SVG Resist Coat Tracks 1 and 2 Training "All" SNF Paul G Allen L107 Cleanroom

Automatic Resist spinning and bake

SVG Resist Coat Track 2
svgcoat2
SVG Resist Coat Tracks 1 and 2 Training "All" SNF Paul G Allen L107 Cleanroom

Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal.

Ultraviolet Photoresist Cure
uvcure
Ultraviolet Photoresist Cure Training "All" SNF Paul G Allen L107 Cleanroom
Wet Bench Solvent Lithography
lithosolv
Lithography Solvent Bench Training Flexible SNF Paul G Allen L107 Cleanroom

Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.

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