Skip to content
Skip to navigation
Stanford Nanofabrication Facility
Navigation menu
Home
Indium Gallium Arsenide
Chemical Formula:
InGaAs
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Aixtron MOCVD - III-V system
aix200
Flexible
SNF MOCVD Paul G Allen 213XA
0.00
-
5.00 μm
AlAs
AlGaAs
GaAs
GaP
GaPN
III-V materials
InAs
InGaAs
InGaAsN