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Indium Gallium Aluminum Nitride

Chemical Formula: 
InGaAlN

Equipment Tabs

Deposition Equipment
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Location Material Thickness Range Approved Materials supplied by Lab
Aixtron MOCVD - III-N system
aix-ccs
SNF MOCVD Paul G Allen 213XA
0.00 - 5.00 μm
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