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Indium Aluminum Nitride
Chemical Formula:
InAlN
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Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
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Material Thickness Range
Approved Materials supplied by Lab
Aixtron MOCVD - III-N system
aix-ccs
Clean (MOCVD)
SNF MOCVD Paul G Allen 213XA
0.00
-
5.00 μm
AlGaN
AlN
GaN
III-N materials
InAlN
InGaAlN
InGaN
InN
